Study of the Nuclear Magnetic Resonance of Ni/Al + tox O2/Ni Nanoscale Thin Films

Abstract

In this paper, The nuclear magnetic resistance study of evaporated Ni / Al + tox O2 / Ni thin films is investigated duo to the potential application in industry because of their tunneling magnetoresistive characteristics. Results showed that the nuclear magnetic resistance of this metal-insulator-metal thin film structure is useful in determining several important fabrication parameters, such as the Ni crystal structure and the optimal O2 plasma oxidation time ox of the Al spacer layer.

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